logo2

発表論文

論文（国際会議のプロシーディングを含む）リストです。新しい順に並んでいます。をク リックすると該当の論文のアブクトラクトが見られます。DOI identifyが割り振られていないものはリンク先がありません。

  1. 曽江 久美、 羽渕 仁恵、今泉 修、内海 緒香 、伊藤 大幸： 学習者のリアルタイム感情測定システムRTEMSの開発，日本教育工学会論文誌 48(1)，in print.
  2. Rahul Kumar, Shiori Kurita, Fumitaka Ohashi, Tamio Iida, Hitoe Habuchi, Tetsuji Kume, Synthesis and Characterization of Type II Ge-Si Clathrate Films for Optoelectronic Applications, Materials 17(2), 504, 2024.
  3. Hitoe Habuchi and Ryosuke Kobayashi, Orientation and crystal structure of two-dimensional carbon nitride films, Japanese Journal of Applied Physics 59, 080907, 2020.
  4. Toru Harigai, Koki Tamekuni, Yushi Iijima, Satoshi Degai, Tsuyoshi Tanimoto, Yoshiyuki Suda1, Hirofumi Takikawa, Shigeki Takago, Haruyuki Yasui, Satoru Kaneko, Shinsuke Kunitsugu, Hitoe Habuchi, Masao Kamiya, Makoto Taki and Hidenobu Gonda, Wear-resistive and electrically conductive nitrogen-containing DLC film consisting of ultra-thin multilayers prepared by using filtered arc deposition, Japanese Journal of Applied Physics 58, SEED05, 2019.
  5. Yushi Iijima, Toru Harigai, Ryo Isono, Takahiro Imai, Yoshiyuki Suda, Hirofumi Takikawa, Masao Kamiya, Makoto Taki, Yushi Hasegawa, Nobuhiro Tsuji,  Satoru Kaneko,  Shinsuke Kunitsugu, Hitoe Habuchi, Shuji Kiyohara, Mikio Ito, Sam Yick, Avi Bendavid, and Phil Martin, Fabrication of Nitrogen-Containing DLC Film by Filtered Arc Deposition as Conductive Hard-Coating Film, Japanese Journal of Applied Physics 57, 01AE07 (5 pages), 2018.
  6. Tetsuji Kume,  Fumitaka Ohashi, Kentaro Sakai, Atsuhiko Fukuyama, Motoharu Imai, Haruhiko Udono, Takayuki Ban, Hitoe Habuchi, Hidetoshi Suzuki, Tetsuo Ikari, Shigeo Sasaki, Shuichi Nonomura, Thin film of guest-free type-II silicon clathrate on Si(111) wafer, Thin Solid Films 609, pp. 30-35, 2016.
  7. S. Fujita, H. Habuchi, S. Takagi, H. Takikawa, Optical properties of graphitic carbon nitride films prepared by evaporation, Diamond & Related Materials 65, pp. 83-86, 2016.
  8. H. Habuchi, S. Fujita, H. Takikawa, PHOTOSENSITIVITY OF GRAPHITIC CARBON NITRIDE FILMS OBTAINED BY EVAPORATION, Proceedings - the 5th Environmental Technology and Management Conference“Green Technology towards Sustainable Environment”(November 23 - 24, 2015, Bandung, Indonesia,). p. PP/AE/009 (4 pages), and also Proceedings of  the Third Joint Seminar of Japan and Indonesia, Environmental Sustainability and Disaster Prevention (3rd ESDP-2015) Institut Teknologi Bandung, Indonesia – November 25th, 2015.
  9. H, Habuchi, S. Fujita, S. Takagi, H, Takikawa, Amorphous and Graphitic Carbon Nitride Films as New Wide Optical Gap Semiconductors, The Second Joint Seminar of Japan and Indonesia  Environmental Sustainability and Disaster Prevention (ESDP-2015) Denpasar, Indonesia – March 22nd – 24th 2015, 1-8.
  10. T. Ban, T. Ogura, Y. Ohashi, R. Himeno, F. Ohashi, T. Kume, Y. Ohya, H. Natsuhara, T. Iida, H. Habuchi, and S. Nonomura, "CComplex changes in the framework of endohedrally Na-doped type II Si clathrates with respect to Na content," J. Mater. Sci., 48 [3], 989-996 (2013).
  11. 稲葉成基，所　哲郎，羽渕仁恵，山田博文、創成型授業への自主的・継続的な取り組みを促進する教育システムの定量的な検証、工学教育 51，No.1，pp.123-127, 2013. [1月発行]
  12. F. Ohashi, M. Hattori, T. Ogura, Y. Koketsu, R. Himeno, T. Kume, T. Ban, T. Iida, H. Habuchi, H. Natsuhara, and S. Nonomura, "High-yield synthesis of semiconductive type-II Si clathrates with low Na content," J. Non-Cryst. Solids, 358 [17], 2134-2137 (2012).
  13. R. Himeno, F. Ohashi, T. Kume, E. Asai, T. Ban, T. Suzuki, T. Iida, H. Habuchi, Y. Tsutsumi, H. Natsuhara, and S. Nonomura, "Optical band gap of semiconductive type II Si clathrate purified by centrifugation," J. Non-Cryst. Solids, 358 [17], 2138-2140 (2012).
  14. Y. Miyajima, Y. Tison, C.E. Giusca, V. Stolojan, H. Watanabe, H. Habuchi, S.J. Henley, J.M. Shannon, S.R.P. Silva, Probing the band structure of hydrogen-free amorphous carbon and the effect of nitrogen incorporation, Carbon 49, pp. 5229-5238, 2011.
  15. R. Himeno, F. Ohashi, R. Koketsu, T. Baba, T. Suzuki, T. Ban, T. Kume, H. Habuchi, T. Iida, Y. Tutsumi, S Nonomura, Bandgap observation of Silicon Clathrate with Variations of Impurity Ratio by Photoacoustic Spectroscopy, Proceedings of Materials Research Society Fall Meeting, AA17.31 (2010).
  16. F. Ohashi, R. Koketsu, H. Ueno, T. Baba, T. Suzuki, T. Kume, T. Ban, T. Iida, H. Habuchi, H. Natsuhara, Synthesis of Type II Silicon Clathrate As a Novel Material for Thin Film Solar Cells, Proceedings of Renewable Energy 2010, P-Pv-9 (2010).
  17. T. Narita, H. Ueno, T. Baba, T. Kume, T. Ban, T. Iida, H. Habuchi, H. Natsuhara, S. Nonomura, Preparation of NaSi thin films for the guest free Si clathrate thin films by heat resistance apparatus using NaSi target materials, Physica status solidi. (c) 7, pp. 1200-1202,  2010. (Published Online: 28 Jan 2010).
  18. 小川信之、羽渕仁恵、実験実習遠隔教育のICT活用による実践、平成21年度高専教育講演論文集、pp. 21-24，2009.
  19. 稲葉成基，所　哲郎，羽渕仁恵，山田博文、エンジニアリングデザインに対する自主的・継続的な取り組みを促進する教育システム、工学教育 55(6), 100-104, 2007 [11.20発行].
  20. H. Habuchi, H. Koketsu and T. Katsuno, Optical properties of amorphous carbon nitride films with high nitrogen content, Diamond and Related Materials16, pp.1340-1342, 2007.
  21. 羽渕仁恵、北川 恵一稲葉成基、山田功、所哲郎、熊崎裕教、安田真、出口利憲、冨田睦雄、山田博文、西田鶴代、三代邦彦, 電気電子および情報工学系創成型実習の外部公開とその効果, 論文集「高専教育」,No. 29, pp. 315-318, 2006.[2006.3発行].
  22. 稲葉 成基, 北川 恵一,山田 功, 所 哲郎, 熊崎 裕教, 安田 真, 出口 利憲, 冨田 睦雄, 羽渕 仁恵, 山田 博文, 西田 鶴代, 三代邦彦, 実践技術のポイント制度とその効果, 論文集「高専教育」, No. 29,pp. 309-313, 2006.[2006.3発行].
  23. Hitoe Habuchi and Daisuke Harada , Optical absorption spectrum measurement of films at a low temperature using photothermal bending spectroscopy, Rev. Sci.Instrum. 76, p. 123907 (4 pages), 2005.
  24. 所哲郎、羽渕仁恵、長南功男：創成型ものづくり教育と連携した産業財産系教育、工業教育 53, No.5, pp.32-36, 2005.
  25. 稲葉成基、北川 恵一、山田功、所哲郎、熊崎裕教、出口利憲、冨田睦雄、羽渕仁恵、福岡大輔, 岐阜工業高等専門学校電気情報工学科のコース別教育課程, 論文集「高専教育」, No.28, pp.249-25, 2005.[2005.3発行].
  26. 稲葉成基、北川 恵一、羽渕仁恵、福岡大輔、西田鶴代、三代邦彦, 岐阜工業高等専門学校電気情報工学科におけるデザイン能力養成のための教育システム, 工業教育 53, No. 53, pp. 89-93, 2005.[2005.1発行].
  27. T. Katsuno, S. Nitta, H. Habuchi, V. Stolojan and S. R. P. Silva,Highly photoconductive amorphous carbon nitride films prepared by cyclic nitrogen radical sputtering, Appl. Phys. Lett. 85, pp. 2803-2806, 2004.
  28. 羽渕仁恵、西田鶴代、加藤真二：ワンチップマイコンを用いた創成実習とその教育効果, 論文集「高専教育」, No. 27, pp. 501-506, 2004.[2004.3発行]
  29. D. Han, K. Wang, J. M. Owens, L. Gedvilas, B. Nelson, H. habuchi and M. Tanaka, Hydrogen structures and the optoelectronic properties in transition films from amorphous to microcrystalline silicon prepared by hot-wire chemical vapor deposition, J. Appl. Phys. 93, pp. 3776-3783, 2003.[23 July 2002 received]
  30. T. Katsuno, S. Nitta, and H. Habuchi, Response time of photoconductivity of amorphous carbon nitride films prepared by a nitrogen radical sputter method, Diamond and Related Materials 11, pp. 1215-1218, 2002.
  31. Takashi Katsuno, Shoji Nitta, and Hitoe Habuchi, Comparison of CPM, PDS and Optical Transmittance of Amorphous Carbon Nitride Films Made by a Nitrogen Radical Sputter Method, Mater. Res. Soc. Symp. Proc. 675, W12.3, 2001.
  32. Yohko Naruse, Shoji Nitta and Hitoe Habuchi, Preparation and properties of amorphous carbon oxynitrides a CNxOy films made by a nitrogen radical sputter method and by the layer-bylayer method, Mater. Res. Soc. Symp. Proc. 675, W10.5, 2001.
  33. Daxing Han, Guozhen Yue, Hitoe Habuchi, Eugene Iwaniczko, and Qi Wing, Electronic states and the light-induced metastability in hydrogenated amorphous silicon prepared by hot-wire CVD, Thin Solid Films 395, pp. 134-137, 2001.[ 3 September 2001 published]
  34. Daxing HAN, Hitoe Habuchi, Akio Nishibe, Tatsuya Namioka, Jing Lin and Guozhen Yue,Optical and electronic properties of microcrystalline silicon deposited by hot-wire chemical vapor deposition, Journal of Non-Crystalline Solids 266-269, pp. 274-278, 2000. [11/29/1999 received]
  35.  Daxing HAN, Guozhen Yue, J. D. Lorentzen, Jing Lin, H. Habuchi and Qi Wang, Optical and electronic properties of microcrystalline silicon as a function of microcrystallinity, J. Appl. Phys. 87, pp. 1882-1888, 2000. [10/28/1999 received]
  36. K. Katsuno, S. Nitta, H. Habuchi, T. Iwasaki, T. Itoh and S. Nonomura, Photoconductivity and Photoluminescence of Amorphous Carbon Nitride a-CNx Films Prepared by the Layer-by-Layer Method, Mat. Res. Soc. Symp. Proc. 593, Amorphous and Nanostructured Carbon, (J.P. Sullivan, J. Robertson, O. Zhou, T.B. Allen, B.F. Coll, editors), 2000, pp. 499-504.[ 11/29/1999 Reserved.]
  37. Hitoe HABUCHI, Shoji NITTA, Daxing HAN and Shuichi Nonomura, Localized electronic states related to O2-intercalation and photo-irradiation on C60 films and C70 films, Journal of Applied Physics 87, pp.8580-8588, 2000. [6/28/1999 received]
  38.   N. KOBAYASHI, S. NITTA, T. YASUI, H. HABUCHI, T. ITOH and S. NONOMURA, Preparation and properties of one-dimensional C60 nanostructures confined in the zeolite FSM-16, Molecular Crystals and Liquid Crystals 340, pp. 781-786, 2000 [5/30/1999 received]
  39. T. Iwasaki, M. Aono, S. Nitta, H. Habuchi, T. Itoh and S. Nonomura, Structural and electronic properties of highly photoconductive amorphous carbon nitride, Diamond and Related Materials 8, pp. 440-445, 1999. [7/25/1998 received]
  40. Hitoe HABUCHI, Shoji NITTA, Daxing HAN and Shuichi NONOMURA, Effects related to O2-intercalation in C70 films studied by electrical conductivity, photoluminescence and constant photocurrent method, Molecular Materials 10, pp. 93-98 (1998). [6/30/1997 received]
  41. Daxing HAN, Hitoe HABUCHI and Shoji NITTA, Temperature dependence of the conductivity and kinetics of oxygen intercalation in C70 films, Daxing HAN, Hitoe HABUCHI, Shoji NITTA, Phys. Rev. B57, pp. 3773-3776, 1998. [8/1/1997 received]
  42. Hitoe HABUCHI, Shoji NITTA, Hiroki MAEHARA and Shuichi NONOMURA, The relation between intercalated oxygen molecules and localized electronic states in C60 films with/without the laser light irradiation, Fullerenes and Photonics IV (Ed. Z. H. Kazafi, Vol. 3142, SPIE press), pp. 184-195, 1997. [7/28/1997 received]
  43. Hitoe HABUCHI, Takashi ITOH, Shoji NITTA and Shuichi NONOMURA, Temperature Dependence of Photoluminescence Spectra of C60 Films and a Luminescence Related to Oxygen Molecules, Applied Surface Science 113/114, pp. 286-290, 1997. [10/7/1996 received]
  44. Hitoe HABUCHI, Erika NISHIMURA, Shoji NITTA and Shuichi NONOMURA, Photoluminescence Spectra of Fullerene Films, Fullerene Science and Technology 5(1), pp. 231-241, 1997. [9/23/1996 received]
  45. Shuichi HASEGAWA, Takahiro NISHIWAKI, Hitoe HABUCHI, Shoji NITTA and Shuichi NONOMURA, Optical Energy Gap and Below Gap Optical Absorption of Fullerene Films Measured by the Constant Photocurrent Method and Photothermal Deflection Spectroscopy, Fullerene Science and Technology 3(2), pp. 163-178, 1995. [8/4/1994 received]
  46. Takashi ITOH, Hitoe HABUCHI, Shoji NITTA and Shuichi NONOMURA, Gas Effusion Spectra of Fullerenes, Fullerene Science and Technology 2(2), pp.181-187, 1994. [10/29/1993 received]
  47. Hitoe HABUCHI, Shoji NITTA, Takahiro NISHIWAKI, Takashi ITOH, Shunichi HASEGAWA and Shuichi NONOMURA, PROPERTIES OF FULLERENE AS INTERCALATED MATERIALS, Proceedings of the 6th International Symposium on Superconductivity; Advances in Superconductivity VI, ( eds. T. Fujita and Y. Shiohara, Vol. 2, Springer-Verlag, Tokyo), pp. 973-976, 1994. [10/26/1993 received]

お問い合わせ

羽渕仁恵

電子メール
habuchi[atmark]gifu-nct.ac.jp

↑